Triode Sputter Ion Pumps
NOTE: Facility for online Application for transfer of technology would be available soon...
Triode Sputter Ion Pumps operate in the pressure range 10 -3 to 10-10 Torr. These pumps are used to create UHV in charged particle accelerators, surface analytical spectrometers, mass spectrometers etc. Technology for 35, 70, 140 & 270 LPS capacity are available.
It is an import substitute product, and has wide range of applications in the field of Ultra high vacuum systems like charged particle accelerators, surface analytical equipment, mass spectrometers etc. These pumps have no moving parts and provide very clean operation. The operating pressure range is 10-3 to 10-10 torr. This technology is available for Transfer of 35, 70, 140 & 270 lps capacity pumps.
These pumps are used to create UHV in charged particle accelerators, surface analytical spectrometers, mass spectrometers etc.Technology for 35, 70, 140 & 270 LPS capacity pumps.
Easy maintenance - Dismantle type body feature except for 35 LPS design
The triode sputter ion pumps are employed to create hydrocarbon-free ultra high vacuum. They utilise the high intensity cold cathode discharge produced in a magnetic field to sputter a highly reactive metal. The reactive metal layer called getter film combined with the active gas molecules such as hydrogen, nitrogen, oxygen, water vapour etc to form low vapour pressure stable compounds, thus reducing the number of gas molecules and hence gas pressure in the system volume.
These pumps operate in the pressure range 10 -3 to 10-10 Torr. They do not require the services of a backing pump continuously but only need initial forepressure of 10-3 Torr. The discharge current being proportional to the background pressure, the pumps also serve as pressure measuring gauges.
These pumps have higher pumping capacity for inert gases compared to its predecessor diode sputter ion pump. These pumps can be mounted on a system in any orientation.
The triode sputter ion pumps are used to create ultra high vacuum in charged particle accelerators, surface analytical spectrometers, mass spectrometers etc. R&D institutes, universities may require such types of pumps
Pumping Speed (1/s)
|Starting Pressure (Torr)||< 5x10-3||< 5x10-3||< 5x10-3||< 5x10-3|
|Ultimate Pressure (Torr)||5x10-10||5x10-10||5x10-10||5x10-10|
|Baking Temp.With magnets (?C)||250||250||250||250|
|Connecting flange NB||63 CF||100 CF||150 CF||150 CF|
|Magnetic Field (Gauss)||1200||1200||1200||1200|
|Stray magnetic field at Flange (Gauss)||< 2||< 2||< 2||< 2|
|No. of sputtering Assemblies||1||2||4||4|
|Max. Operating Voltage (kv)||6.2||6.2||6.2||6.2|
|Short Circuit Current (mA)||100||200||500||750|
NOTE:Facility for online Application for transfer of technology would be available soon...
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General License Fee : ₹ 250,000.00 (Two Lakh Fifty Thousand)
General Royalty : 0%