-A A +A

This link shall take you to a page/website outside this website. For any query regarding the contents of the linked page/website, please contact the webmaster of the concerned website.

If you have already registered as a licensee then click on SIGN IN otherwise click on SIGN UP for register as a licensee.

High purity tri-methyl gallium (99.999%)

Trimethylgallium, Ga(CH3)3, (TMG) is commonly used metalorganic source of gallium for metalorganic vapour phase epitaxy (MOVPE) for preparation of gallium-containing compound semiconductors, such as gallium arsenide (GaAs) (used in space applications, galium nitride (GaN), gallium phosphide (GaP), gallium antimonide (GaSb) (used in fabrication of optoelectronic devices), copper indium gallium sulfide and copper indium gallium selenide (CIGS) (used in manufacture of high efficiency solar panels).

Trimethylgallium, Ga(CH3), often abbreviated to TMG or TMGa, commonly used metalorganic source of gallium for metalorganic vapour phase epitaxy (MOVPE) for preparation of gallium-containing compound semiconductors used in fabricaton of optoelectronic devices and solar panels.
In our synthethetic method the intermediate adduct of TMG is prepared which has no such limitation & can be stored for long time without any stringent safety precautions. 
The emphasis of Government on semiconductor chips manufacturing in India, will boost the demand indigenously sourced raw materials.

Specifications:

  • TMG is a clear, colorless, pyrophoric liquid ie. catch fire on exposure to air. TMG is known to react violently with water and other compounds that are capable of providing labile and active hydrogen (i.e. protons).
  • TMG needs to be handled with care and caution, e.g. stored in a cool, dry place at 0-25 °C, under inert atmosphere, and ensuring that storage temperatures would not exceed 40 °C to avoid deterioration. 

Application

  • Trimethylgallium, Ga(CH3)3, TMG or TMGa is commonly used metalorganic source of gallium for metalorganic vapour phase epitaxy (MOVPE) for preparation of gallium-containing compound semiconductors, such as:- 
    gallium arsenide (GaAs) (used in space applications, blue LED material galium nitride (GaN), 
    gallium phosphide (GaP), gallium antimonide (GaSb) (used in fabrication of optoelectronic devices), 
    copper indium gallium sulfide and copper indium gallium selenide (CIGS) (used in manufacture of high efficiency solar panels).

  • TMG is used for preparation of thin films of gallium based semiconductor materials 
    which are used in micro-electronic and high speed devices.
  • TMG is routinely used for preparation of GaAs, GaN, GaP thin films.

Introduction :

Trimethylgallium, >Ga(CH3), often abbreviated to TMG or TMGa, commonly used metalorganic source of gallium for metalorganic vapour phase epitaxy (MOVPE) for preparation of gallium-containing compound semiconductors used in fabricaton of optoelectronic devices and solar panels. In our synthethetic method the intermediate adduct of TMG is prepared which has no such limitation & can be stored for long time without any stringent safety precautions.

The emphasis of Government on semiconductor chips manufacturing in India, will boost the demand indigenously sourced raw materials.

Specification :

  • Stoichimetric ratio of magnesium and gallium are heated together to form an alloy.
  • Grey lustrous solid, which can be ground to powder during the synthesis of organometallic compounds.ith special emphasis of the Government of India on setting semiconductor device manufacturing firms in India, the demand for indigenously sourced raw materials is expected to rise.

Salient features :

  • Presently TMG is not indigenously manufactured and needs to be imported.
  • Use of hygroscopic and expensive chemicals like GaCl3 and MeLi or toxic R2Hg can be avoided.
  • In our synthetic method the intermediate adduct of TMG is prepared which has no such limitation and can be stored for long time without any stringent safety precautions.
  • Synthesized from readily available raw material sourced from local market.

Application :

  • Trimethylgallium,>Ga(CH3)3, TMG or TMGa is commonly used metalorganic source of gallium for metalorganic vapour phase epitaxy (MOVPE) for preparation of gallium-containing compound semiconductors, such as:-
    • gallium arsenide (GaAs) (used in space applications, blue LED material galium nitride (GaN)
    • gallium phosphide (GaP), gallium antimonide (GaSb) (used in fabrication of optoelectronic devices)
    • copper indium gallium sulfide and copper indium gallium selenide (CIGS) (used in manufacture of high efficiency solar panels)
  • TMG is used for preparation of thin films of gallium based semiconductor materials which are used in micro-electronic and high speed devices.
  • TMG is routinely used for preparation of GaAs, GaN, GaP thin films.

Infrastructure :
A chemical laboratory having a vacuum pump (1.5HP, 2 mbar) Fume hood (500 m3/h) & Stainless steel 304 L Glove Box (1m (H) x 1m (W) x 0.5 m(D) is required with a well ventilated area of 10ft x 15 ft is sufficient for production of TMG.

Raw Materials :
The raw materials are easily available in local market.

Manpower
Two chemists (B.Sc. in Chemistry) & Laboratory technician (for maintenance of facilities) are required for the production.

SR NO. COUNTRY NAME PATENT NUMBER
No Data Found.
SR NO. NAME STANDARD NUMBER LOGO
No Data Found.

General License Fee : ₹ 615,000.00 (Six Lakh Fifteen Thousand)

General Royalty : 0%